Author:
Tanaka Tatsuo,Nakajima Tohru,Yamashita Koichi
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference45 articles.
1. Extended Abstracts of International Electron Device Meeting, Washington, DC;Tsubouchi,1991
2. Proceedings of 13th International VLSI Multilevel Interconnection Conference;Takahashi,1998
3. Low Pressure Chemical Vapor Deposition of Tungsten and Aluminum for VLSI Applications
4. M.J. Cooke, R.A. Heinecke, R.C. Stem, Solid State Technol. 62 (1982).
5. Surface topography changes induced by chemical vapor deposition of aluminum on Al(111)
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