X-ray photoelectron spectroscopy and grazing incidence X-ray reflectivity study of silicon nitride thin films-Reference-Cited by-同舟云学术

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X-ray photoelectron spectroscopy and grazing incidence X-ray reflectivity study of silicon nitride thin films

Published:1998-12 Issue:1-2 Volume:334 Page:140-144
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Li Boquan,Fujimoto Toshiyuki,Fukumoto Natsuo,Honda Kumasa,Kojima Isao

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Topology of Silicon Structures with Recessed SiO2

2. The preparation, characterization and applications of silicon nitride thin films

3. Theory of MNOS memory transistor

4. Hydrogen and deuterium migration in annealed plasma-deposited silicon nitride films

5. Observation of multiple defect states at silicon–silicon nitride interfaces fabricated by low-frequency plasma-enhanced chemical vapor deposition

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of silicon surface implanted by nitrogen ion beam from plasma focus device;Materials Research Express;2019-07-03

2. Effect of argon flow on promoting boron doping forin-situgrown silicon nitride thin films containing silicon quantum dots;Nanotechnology;2017-06-20

3. H2-Ar dilution for improved c-Si quantum dots in P-doped SiNx:H thin film matrix;Applied Surface Science;2017-02

4. Drastic improvement of as-sputtered silicon nitride thin film quality at room temperature by ArF excimer-laser annealing method;Current Applied Physics;2016-08

5. Diffusion studies in magnetron sputter deposited silicon nitride films;Surface and Coatings Technology;2014-09

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