Proposal of a novel in situ stress-reducing method for the growth of c-BN
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. P.B. Mirkarimi, K.F. McCarty, D.L. Medlin, Mater. Sci. Eng. Rep. (1997) submitted.
2. Phase stability and stress relaxation effects of cubic boron nitride thin films under 350 keV ion irradiation
3. Radio frequency ion plating-induced phase transition from h-BN to nanocrystalline c-BN
4. Formation of Cubic Boron Nitride Film on Si with Boron Buffer Layers
5. J. Ullmann, A.J. Kellock, J.E.E. Baglin, Surf. Coat. Technol., 1997 submitted.
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Stress reduction of cubic boron nitride films by oxygen addition;Thin Solid Films;2008-12
2. Synthesis and characterization of single and multilayer boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide;Thin Solid Films;2002-07
3. Growth of low-stress cubic boron nitride films by simultaneous medium-energy ion implantation;Applied Physics Letters;2002-01-07
4. In-situ stress diagnostics;Surface and Coatings Technology;2001-07
5. Microstructural observation of a composite film of c-BN and h-BN phases;Journal of Materials Research;2000-11
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