Author:
Wang Feng-Ping,Cheng Li-Sen,Wang Pei-Xuan,Lu Kun-Quan
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Cited by
2 articles.
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1. Poly-Si/TiN/Mo/HfO2 gate stack etching in high-density plasmas;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-01
2. X-ray reflectivity study of radio frequency sputtered silicon oxide on silicon;Thin Solid Films;2005-10