Low temperature process for nano-structure formation with Si films-Reference-Cited by-同舟云学术

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Low temperature process for nano-structure formation with Si films

Published:2000-12 Issue:1-2 Volume:379 Page:101-106
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Nam Hyoung Gin,Koo Kyoung-Hwan

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Laser irradiation of GaAsGaAlAs multi-quantum well structure

2. Ultraviolet emission of silicon quantum tips

3. The Radio-Frequency Single-Electron Transistor (RF-SET): A Fast and Ultrasensitive Electrometer

4. Y. Takahashi, A. Fujiwara, K. Yamazaki, H. Namatsu, K. Kurihara, K. Murase, Int. Elect. Dev. Meeting (1998) 127.

5. A silicon nanocrystals based memory

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. NANOSILICON FOR PHOTONIC APPLICATIONS;International Journal of Modern Physics B;2007-09-10

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