Field emission characteristics of cesiated amorphous carbon films by negative carbon ion-Reference-Cited by-同舟云学术

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Field emission characteristics of cesiated amorphous carbon films by negative carbon ion

Published:1999-11 Issue: Volume:355-356 Page:199-204
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Won Han Dong,Hwan Kim Yong,Jun Choi Dong,Joon Chi Eung,Young Yoon Woo,Koo Baik Hong

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. IEEE;Spindt;Trans. Electron devices,1991

2. Vacuum properties of a new panel structure for field emission displays

3. Properties of diamond-like carbon

4. Electron emission characteristics of diamond like carbon films deposited by laser ablation technique

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1. Room temperature deposition of crystalline indium tin oxide films by cesium-assisted magnetron sputtering;Applied Surface Science;2008-08

2. Diamond-like carbon as a buffer layer in polymeric electroluminescent device;Thin Solid Films;2005-07

3. Charge Assisted Deposition of Polycrystalline Silicon Thin Films by Cesium Sputter Ion Beam Deposition;Japanese Journal of Applied Physics;2004-10-08

4. Synthesis and mechanical properties of amorphous carbon films by closed-field unbalanced magnetron sputtering;Materials Letters;2004-03

5. A study for the bias control of indium–tin–oxide films synthesized by cesium assisted radio frequency magnetron sputtering;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2003-07

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