ZT thin films produced by metal organic-chemical vapour deposition to be used as high-k dielectrics
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference20 articles.
1. Dielectric Properties of Radio Frequency Magnetron Sputter Deposited Zirconium Titanate‐Based Thin Films
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5. Electrical Characteristics of the RF Magnetron‐Sputtered Tantalum Pentoxide‐Silicon Interface
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1. Modification of RbTiOPO 4 (001) crystal surface induced by Ar + ion bombardment: X-ray photoelectron spectroscopy and first-principles studies;Vacuum;2018-01
2. Electronic structure of ZrTiO4 and HfTiO4: Self-consistent cluster calculations and X-ray spectroscopy studies;Journal of Physics and Chemistry of Solids;2011-02
3. Dielectric properties of ambient temperature grown nanocrystalline ZrTiO4 thin films using DC magnetron sputtering;Materials Science and Engineering: B;2010-04
4. X-ray photoelectron spectroscopy study of ZrO2∕TiO2∕Si stack;Applied Physics Letters;2007-10-22
5. Low-Energy Ar+ Ion-Beam-Induced Amorphization and Chemical Modification of Potassium Titanyl Arsenate (001) Crystal Surfaces;The Journal of Physical Chemistry C;2007-01-24
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