Microstructural improvement of sputtered ZrO2 thin films by substrate biasing
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference25 articles.
1. The drive to miniaturization
2. Solution-based Fabrication of High-κ Gate Dielectrics for Next-Generation Metal-Oxide Semiconductor Transistors
3. Stable zirconium silicate gate dielectrics deposited directly on silicon
4. High-κ gate dielectrics: Current status and materials properties considerations
5. Temperature dependence of gate currents in thin Ta2O5 and TiO2 films
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