Low energy ion scattering study of palladium films on silicon(111)-7 × 7 surfaces
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference28 articles.
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1. Formation of Palladium Silicide Films on Silicon(111)7×7 Surface at ∼150 K;Japanese Journal of Applied Physics;2005-03-08
2. Room Temperature Formation of Crystallized Palladium Silicide on Si(111) Observed by Ultrahigh Voltage Electron Microscopy;Japanese Journal of Applied Physics;2002-03-15
3. Ion scattering spectroscopy;Vacuum;1994-06
4. Nucleation and surface reconstruction of Pd on Si(100) observed by scanning tunneling microscopy;Surface Science;1993-03
5. Film Thickness Effects and their Influence on the Stability of the CrSiO/VO/Al Film Systems;physica status solidi (a);1990-06-16
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