Reversible polystyrene-block-poly(methyl methacrylate) copolymer films with perpendicular orientation by ultra-thin polystyrene substrates-Reference-Cited by-同舟云学术

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Reversible polystyrene-block-poly(methyl methacrylate) copolymer films with perpendicular orientation by ultra-thin polystyrene substrates

Published:2020-10 Issue: Volume:147 Page:105721
ISSN:0300-9440
Container-title:Progress in Organic Coatings
language:en
Short-container-title:Progress in Organic Coatings

Author:

Wang Juanjuan,Shi Weihe,Luo Zhengjie,Chen Shuangjun,Xue Kailai

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Organic Chemistry,Surfaces, Coatings and Films,General Chemical Engineering

Reference37 articles.

1. Patterning with block copolymer thin films;Segalman;Mater. Sci. Eng. R-Rep.,2005

2. Directed self-assembly of block copolymers on chemical patterns: a platform for nanofabrication;Ji;Prog. Polym. Sci.,2016

3. Enabling nanotechnology with self assembled block copolymer patterns;Park;Polymer,2003

4. Recent progress in high resolution lithography;Bratton;Polym. Adv. Technol.,2006

5. Block copolymer thermodynamics - theory and experiment;Bates;Annu. Rev. Phys. Chem.,1990

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1. Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives;Nanotechnology;2023-03-06

2. Interfacial effects of plasticizers on the properties of cellulose diacetate materials;Cellulose;2022-07-24

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