XPS and HRTEM characterization of cobalt–nickel silicide thin films-Reference-Cited by-同舟云学术

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XPS and HRTEM characterization of cobalt–nickel silicide thin films

Published:2000-07 Issue:1-2 Volume:161 Page:61-73
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Garcı́a-Méndez M,Castillón F.F,Hirata G.A,Farı́as M.H,Beamson G

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference53 articles.

1. Self-aligned Ti and Co silicides for high performance sub-0.18 μm CMOS technologies

2. Vertical silicon metal–semiconductor–metal photodetectors with buried CoSi2 contact

3. Application of high energy resolved X-ray emission spectroscopy for monitoring of silicide formation in Co/SiO2/Si system

4. Electrical transport in (100)CoSi2/Si contacts

5. Energy-band structure ofCoSi2epitaxially grown on Si(111)

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3. Effect of interfacial disordered spins on the magnetism of Co/Si multilayers;Journal of Materials Science: Materials in Electronics;2023-03

4. Analysis of Cobalt Intercalation under the Buffer Carbon Layer on a SiC(0001) Single Crystal;Journal of Experimental and Theoretical Physics;2022-02

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