Growth and characterization of W thin films with controlled Ne and Ar contents deposited by bipolar HiPIMS-Reference-Cited by-同舟云学术

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Growth and characterization of W thin films with controlled Ne and Ar contents deposited by bipolar HiPIMS

Published:2021-12 Issue: Volume:29 Page:101091
ISSN:2352-1791
Container-title:Nuclear Materials and Energy
language:en
Short-container-title:Nuclear Materials and Energy

Author:

Tiron V.,Bulai G.,Costin C.,Velicu I.-L.,Dincă P.,Iancu D.,Burducea I.

Publisher

Elsevier BV

Subject

Nuclear Energy and Engineering,Materials Science (miscellaneous),Nuclear and High Energy Physics

Reference42 articles.

1. Nitrogen and neon retention in plasma-facing materials

2. Impurity seeding for tokamak power exhaust: from present devices via ITER to DEMO

3. Impurity seeding in ITER DT plasmas in a carbon-free environment

4. Divertor power load feedback with nitrogen seeding in ASDEX Upgrade

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deuterium retention in tungsten co-deposits with neon and argon inclusions;Nuclear Materials and Energy;2024-06

2. Synergistic Effect of He for the Fabrication of Ne and Ar Gas-Charged Silicon Thin Films as Solid Targets for Spectroscopic Studies;Nanomaterials;2024-04-21

3. DFT based kinetic Monte Carlo study of metal surface Growth: Comparison of a restricted and an unrestricted diffusion model;Computational Materials Science;2024-01

4. Structural, mechanical and tribological properties of WCTiN coatings produced by HiPIMS;Proceedings of the Institution of Mechanical Engineers, Part B: Journal of Engineering Manufacture;2023-05-17

5. Tribological behavior of WC/WCN/CNx coatings deposited by high power impulse magnetron sputtering;Journal of Vacuum Science & Technology A;2023-04-20

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