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Influence of UV light irradiation on film thickness distribution of tin oxide films by photochemical vapour deposition

  • Published:2001-01 Issue: Volume:169-170 Page:425-427
  • ISSN:0169-4332
  • Container-title:Applied Surface Science
  • language:en
  • Short-container-title:Applied Surface Science

Author:

Tamura S.,Ishida T.,Magara H.,Mihara T.,Mochizuki S.,Tatsuta T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Precursor Chemistry – Main Group Metal Oxides;Comprehensive Inorganic Chemistry II;2013

2. Preparação de eletrodos opticamente transparentes;Química Nova;2005-03

3. An Experimentally Assisted Computational Analysis of Tin Oxide Deposition in a Cold-Wall APCVD Reactor;Journal of The Electrochemical Society;2004

4. Atomic Layer Deposition of Epitaxial and Polycrystalline SnO2 Films from the SnI4/O2 Precursor Combination;Chemical Vapor Deposition;2003-01-03

5. Photochemical Vapour Deposition of Thin Films;Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies;2002
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