1. A.T. Bell, Fundamentals of plasma chemistry, in: J.R. Hollan, A.T. Bell (Eds.), Techniques and Applications of Plasma Chemistry, Wiley, New York, 1974.
2. H. Yasuda, in: J. Vossen, W. Kern (Eds.), Thin Film Processes, New York, 1978, p. 361.
3. B. Chapman, Glow Discharge Processes — Sputtering and Plasma Etching, Wiley, New York, 1980, p. 149.
4. R. d’Agostino, Plasma Deposition, Treatment, and Etching of Polymers, Academic Press, New York, 1990.
5. Glow discharge polymerization of tetramethylsilane investigated by infrared spectroscopy and ESCA