Quantum chemical study on p-doping effect of F-terminated silicon surface reaction with silane-Reference-Cited by-同舟云学术

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Quantum chemical study on p-doping effect of F-terminated silicon surface reaction with silane

Published:1997-06 Issue: Volume:117-118 Page:54-60
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Tachibana Akitomo,Sakata Ken

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference27 articles.

1. Technical Digest;Ohmi,1989

2. Principles of wet chemical processing in ULSI microfabrication

3. T. Ohmi, private communication.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quantum chemical study of aluminum CVD reaction for titanium nitride (111) surface with terminal fluorine;Journal of Molecular Structure: THEOCHEM;2000-07

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