UHV aluminium oxide on silicon substrates: electron spectroscopies analysis and electrical measurements-Reference-Cited by-同舟云学术

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UHV aluminium oxide on silicon substrates: electron spectroscopies analysis and electrical measurements

Published:2001-05 Issue: Volume:175-176 Page:656-662
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Gruzza B,Merle S,Bideux L,Robert C,Kover L,Toth J,Matolin V

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference9 articles.

1. Tunnel barrier growth dynamics of Nb/AlOxAl/Nb and Nb/A1NxAl/Nb Josephson junctions

2. Fabrication and properties of vertically stacked Nb/Al AlOχ/Nb Josephson tunnel junctions

3. Electronic and crystallographic structure of γ-alumina thin films

4. On the stability of vapor grown palladium particles supported on amorphous alumina

5. Vacuum evaporation of thin alumina layers

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation and Characterization of Al₂O₃ Thin Films for Catalytic Activity Studies;Solid State Phenomena;2010-01

2. Electronic properties of thin films of laser-ablated Al2O3;Applied Surface Science;2009-01

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