Growth chemistry of SiC alloys from SiF4–CH4 plasmas-Reference-Cited by-同舟云学术

Growth chemistry of SiC alloys from SiF4–CH4 plasmas

Published:2001-12 Issue:1-4 Volume:184 Page:66-71
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cicala G.,Capezzuto P.,Bruno G.,Rossi M.C.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference21 articles.

1. W.H. Bloss, in: R. Hill, W. Palz, P. Helm (Eds.), in: Proceedings of the 12th European Photovoltaic Solar Energy Conference, Vol. I, H.S. Stephens and Associates, 1994, pp. 37–43.

2. Y. Hamakawa, W. Ma, H. Okamoto, in: G. Bruno, P. Capezzuto, A. Madan (Eds.), Plasma Deposition of Amorphous Silicon-based Materials, Academic Press, San Diego, 1995, pp. 283–314 (Chapter VI).

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