Correlation between deposition parameters and structural modification of amorphous carbon nitride (a-CNx) film in magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference17 articles.
1. Superhard and Elastic Carbon Nitride Thin Films Having Fullerenelike Microstructure
2. Reactive sputtering of carbon and carbide targets in nitrogen
3. Prediction of New Low Compressibility Solids
4. Paracyanogenlike Structures in High-Density Amorphous Carbon Nitride
5. Transport of Carbon in Nonisothermal Low Pressure Nitrogen Plasma
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1. Structural changes of a-CNx thin films induced by thermal annealing;AIP Conference Proceedings;2018
2. Influence of nitrogen variation on the microstructrual, mechanical and tribological properties of CNx coatings deposited by dc unbalanced magnetron sputtering;Surface and Coatings Technology;2017-12
3. Low friction of graphene nanocrystallite embedded carbon nitride coatings prepared with MCECR plasma sputtering;Surface and Coatings Technology;2017-12
4. Effect of boron and silicon doping on the surface and electrical properties of diamond like carbon films by magnetron sputtering technique;Surface and Coatings Technology;2013-09
5. Compensation effect of boron and nitrogen codoping on the hardness and electrical resistivity of diamond-like carbon films prepared by magnetron sputtering deposition;Journal of Materials Research;2012-10-31
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