X-ray photoelectron spectroscopy of thermal thin Ta2O5 films on Si
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference38 articles.
1. UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs
2. Ultrathin Tantalum Oxide Capacitor Dielectric Layers Fabricated Using Rapid Thermal Nitridation prior to Low Pressure Chemical Vapor Deposition
3. Reliability characteristics of metal‐oxide‐semiconductor capacitors with chemical vapor deposited Ta2O5gate dielectrics
4. The reactive sputtering of tantalum oxide: Compositional uniformity, phases, and transport mechanisms
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