Enhancement in the quality of GaN crystal grown on a thermal-treated silicon substrate
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference11 articles.
1. The growth of single crystalline GaN on a Si substrate using AIN as an intermediate layer
2. GaN growth on Si(111) substrate using oxidized AlAs as an intermediate layer
3. The effect of AlN buffer layer on GaN grown on (111)-oriented Si substrates by MOCVD
4. High quality GaN grown on Si(111) by gas source molecular beam epitaxy with ammonia
5. Dislocation density reduction via lateral epitaxy in selectively grown GaN structures
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. AlGaN/GaN-heterostructures on (111) 3C-SiC/Si pseudo substrates for high frequency applications;Thin Solid Films;2011-10
2. Development of Control Method for Residual Stress in Thin Film by Substrate Vibration;Journal of the Japan Society for Precision Engineering, Contributed Papers;2004
3. A Study of Elemental Interdiffusion in GaN/Si Wafer Grown by Metalorganic Vapor Phase Epitaxy;MRS Proceedings;2003
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