5-axis Control Ultra-precision Machining of Complex-shaped Mirrors for Extreme Ultraviolet Lithography System

Author:

Takino H.,Kawai T.,Takeuchi Y.

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference9 articles.

1. High-efficiency Condenser Design for Illuminating a Ring Field;Sweatt;OSA Proc. on Soft X-ray Projection Lithography,1993

2. Synchrotron Radiation Sources and Condensers for Projection X-ray Lithography;Murphy;Appl. Opt.,1993

3. A Novel Condenser for EUV Lithography Ring-Field Projection Optics;Chapman;Proc. SPIE,1999

4. Novel illumination system for EUVL;Komatsuda;Proc. SPIE,2000

5. Non-adhesive Direct Bonding of Tiny Parts by Means of Ultraprecision Trapezoid Microgrooves;Takeuchi;Journal of Micro system Technologies, Springer-Verlag,2001

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