Cryo-FIB machining of group III-V semiconductors suppresses surface nanodroplets
Author:
Funder
Dalian University of Technology
Publisher
Elsevier BV
Reference17 articles.
1. Nanometre-Scale Electronics With III–V Compound Semiconductors;Del Alamo;Nature,2011
2. Nanoscale 3D Printing Process Using Aerodynamically Focused Nanoparticle (AFN) Printing, Micro-Machining, And Focused Ion Beam (FIB);Ahn;Annals of the CIRP,2015
3. Nanoscale Hybrid Manufacturing Process by Nano Particle Deposition System (NPDS) And Focused Ion Beam (FIB);Ahn;Annals of the CIRP,2011
4. Formation of Nanodots on GaAs by 50kev Ar+ Ion Irradiation;Kumar;Applied Surface Science,2012
5. Size And Site Controlled Ga Nanodots on GaAs Seeded by Focused Ion Beams;Lugstein;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena,2004
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