Effect of Substrate Temperature on Aluminium Thin Films Prepared byRF-Magnetron Sputtering

Author:

MadarakaMwema Fredrick,PhilipOladijo Oluseyi,TitilayoAkinlabi Esther

Publisher

Elsevier BV

Subject

General Medicine

Reference18 articles.

1. Corrosion Resistance Properties of Aluminum Coating Applied by Arc Thermal Metal Spray in SAE J2334 Solution with Exposure Periods;Lee;Metals,2016

2. Themperature Effect on Microstructure and Mechanical Properties of Aluminum Film Deposited on Glass Substrates;Her;Indian Journal of Engineering & Materials Sciences,2015

3. Effect of Ar Gas Pressure on Growth, Structure, and Mechanical Properties of Sputtered Ti, Al, TiAl, and Ti3Al Films;Chinmulgund;Thin Solid Films,1995

4. A Study on the Crystallographic Orientation with Residual Stress and Electrical Property of Al films Deposited by Sputtering;Kim;Thin Solid Films,1998

5. Effects of Substrate Temperature on Copper Distribution, Resistivity, and Microstructure in Magnetron-Sputtered Al-Cu Films;Ahn;Thin Solid Films,1987

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