Characterization of magnetron sputtered Si3N4 thin films deposited on Aluminum alloy substrates
Author:
Publisher
Elsevier BV
Subject
General Medicine
Reference8 articles.
1. Composition, structure and properties of SiNx films fabricated by pulsed reactive closed-field unbalanced magnetron sputtering
2. Deposition of silicon nitride thin films by RF magnetron sputtering: a material and growth process study
3. Effect of deposition conditions on mechanical properties of low-temperature PECVD silicon nitride films
4. A study on resistance of PECVD silicon nitride thin film to thermal stress-induced cracking
5. Mechanical properties of sputtered silicon nitride thin films
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1. Tribological Characteristics of Tantalum-Oxide Coating Fabricated on Pre-Treated 2024 Aluminum Alloys;Journal of Tribology;2023-06-26
2. Optimization of Processing Parameters and Adhesive Properties of Aluminum Oxide Thin-Film Transition Layer for Aluminum Substrate Thin-Film Sensor;Micromachines;2022-11-30
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4. Study of Si3N4 reinforcement on the morphological and tribo-mechanical behaviour of aluminium matrix composites;Materials Research Express;2019-01-09
5. Effects of Hydrostatic Pressure and Biaxial Strains on the Elastic and Electronic Properties of β -Si3 N4;physica status solidi (b);2018-02-12
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