The effects of SiCl4 and GeCl4 oxidation, variable properties, buoyancy and tube rotation on the modified chemical vapor deposition process

Author:

Joh S.,Greif R.

Publisher

Elsevier BV

Subject

Fluid Flow and Transfer Processes,Mechanical Engineering,Condensed Matter Physics

Reference36 articles.

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2. A new technique for preparation of low-loss and graded index optical fibers;MacChesney,1974

3. Thermophoresis: the mass transfer mechanism in modified chemical vapor deposition;Simpkins;J. Appl. Phys.,1979

4. Thermophoretic deposition of small particles in laminar tube flow;Walker;J. Colloid Interface Sci.,1979

5. An overview of the modified chemical vapor deposition (MCVD) process and performance;Nagel;IEEE J. Quantum Electron. QE-18,1982

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