Laser-generated plasmas: Source requirements for x-ray microscopy
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Radiology, Nuclear Medicine and imaging,Instrumentation,Radiation
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Fabrication of Fresnel zone plates by ion-beam lithography and application as objective lenses in extreme ultraviolet microscopy at 13 nm wavelength;Optics Letters;2012-12-07
2. Generation of multi-keV monochromatic twin x-ray point sources based on laser-driven vacuum diode;Review of Scientific Instruments;2005-10
3. Single shot twin x-ray microscopic imaging using simultaneously produced laser-plasma x-ray sources;Review of Scientific Instruments;2001
4. Mechanisms and origin of continuum and line emission from carbon plasmas produced by ultrashort laser pulses;Journal of Physics B: Atomic, Molecular and Optical Physics;1996-10-14
5. XUV generation from plasma produced by a XeCl excimer laser on a Cu target;Il Nuovo Cimento D;1993-08
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