FTIR studies of water and ammonia decomposition on silicon surfaces-Reference-Cited by-同舟云学术

FTIR studies of water and ammonia decomposition on silicon surfaces

Published:1990-01 Issue: Volume:54-55 Page:1085-1095
ISSN:0368-2048
Container-title:Journal of Electron Spectroscopy and Related Phenomena
language:en
Short-container-title:Journal of Electron Spectroscopy and Related Phenomena

Author:

Dillon A.C.,Gupta P.,Robinson M.B.,Bracker A.S.,George S.M.

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Radiation,Electronic, Optical and Magnetic Materials

Reference55 articles.

1. Localized bond model for H2O chemisorption on silicon surfaces

2. Ultraviolet photoemission spectroscopy of NH3 and NO on Si(111) surfaces

3. Interactions of water vapor and oxygen with Si(111) surfaces studied by low‐energy electron‐loss spectroscopy

4. Adsorption of H2S, H2O and O2 on Si(111) surfaces

5. High-resolution electron-energy-loss study ofNH3adsorption on Si(111)21at room temperature

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