Author:
Okabayashi H.,Tanikawa A.,Mori H.,Fujita H.
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. ULSI Science and Technology 1989;Okabayashi,1989
2. A model for stress-induced metal notching and voiding in very large-scale-integrated Al–Si (1%) metallization
3. F.G. Yost, D.E. Amos and A.D. Romig, in: Proc. 1989 IEEE Int. Reliability Phys. Symp., p. 40.
4. Voiding due to thermal stress in narrow conductor lines
5. A. Tezaki, T. Mineta, H. Egawa and T. Noguchi, in: Proc. 1990 IEEE Int. Reliability Phys. Symp., p. 221.
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献