Sputter redeposition as a limit to spatially three-dimensional SIMS microanalysis
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Electron-Beam, X-ray, and Ion-Beam Techniques for Submicrometer Lithographies IV;Parker,1985
2. Secondary Ion Mass 'Spectrometry (SIMS) IV;Waugh,1984
3. New Developments in Spatially Multidimensional Ion Microprobe Analysis
4. Secondary ion mass spectrometric image depth profiling for three-dimensional elemental analysis
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