Multi-objective optimization for inherently selective atomic layer deposition of zirconia on silicon and not on copper-Reference-Cited by-同舟云学术

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Multi-objective optimization for inherently selective atomic layer deposition of zirconia on silicon and not on copper

Published:2023-08 Issue: Volume:196 Page:483-494
ISSN:0263-8762
Container-title:Chemical Engineering Research and Design
language:en
Short-container-title:Chemical Engineering Research and Design

Author:

Saha Soumya,Mukherjee Rajib,Diwekar Urmila M.,Takoudis Christos^ORCID

Funder

National Science Foundation

Publisher

Elsevier BV

Subject

General Chemical Engineering,General Chemistry

Reference36 articles.

1. Optimization of substrate-selective atomic layer deposition of zirconia on electroplated copper using ethanol as both precursor reactant and surface pre-deposition treatment;Anderson;J. Mater. Sci.: Mater. Electron.,2021

2. Correlation and prediction of liquid-phase adsorption on zeolites using group contributions based on adsorbate−solid solution theory;Berti;undefined,1999

3. Inherently selective atomic layer deposition and applications;Cao;Chem. Mater.,2020

4. Multiobjective optimization;Diwekar;Springe Optim. Its Appl.,2020

5. Sampling Techniques;Diwekar;Kirk. - Othmer Encycl. Chem. Technol.,2007

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