Fundamentals of Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Fundamentals of Chemical Vapor Deposition

Published:1999 Issue: Volume: Page:36-67
ISSN:
Container-title:Handbook of Chemical Vapor Deposition (CVD)
language:
Short-container-title:

Author:

Pierson Hugh O.

Publisher

Elsevier

Reference31 articles.

1. Thermochemical Modeling of Steady-State CVD Process;Spear,1984

2. Chemical Vapor Deposition of Inorganic Thin Films;Kern,1987

3. Chemical Vapor Deposition Modeling—An Assessment of Current Status;Gokoglu,1990

4. The CVD of TiB2 from Diborane;Pierson;Thin Solid Films,1980

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