CVD Processes and Equipment-Reference-Cited by-同舟云学术

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CVD Processes and Equipment

Published:1999 Issue: Volume: Page:108-146
ISSN:
Container-title:Handbook of Chemical Vapor Deposition (CVD)
language:
Short-container-title:

Author:

Pierson Hugh O.

Publisher

Elsevier

Reference35 articles.

1. Tailored Surface and Modifications by Ion Implantation;Picreaux;Science,1986

2. Vapor Deposition;Powell,1966

3. Wachtell, R. L., and Seelig, R. P., U.S. Patent 3,037,883, (June 5, 1962)

4. A User's Guide to Accurate Gas Flow Calibration;LeMay;Solid State Technology,1996

5. Digital Mass Flow Controller Come of Age;Drexel;Solid State Technology,1996

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis Aspects of Nanoporous and Quasi-One-Dimensional Thin Film Architecture Photoelectrodes for Artificial Photosynthesis;Handbook on Synthesis Strategies for Advanced Materials;2022

2. Chemical Vapor Deposition;Handbook of Solid State Chemistry;2017-08-09

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