The role of field emission in submicron electron beam testing-Reference-Cited by-同舟云学术

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The role of field emission in submicron electron beam testing

Published:1983-08 Issue:4 Volume:106 Page:241-255
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Swanson L.W.,Tuggle D.,Li Jia-Zheng

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Stroboscopic scanning electron microscopy

2. SEM I;Wittels,1979

3. Scanning Electron Microscopy;Fleming,1970

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron Beam probing for design verification at Intel;Microelectronic Engineering;1994-03

2. First results with a high‐imaging speed scanning electron microscope;Review of Scientific Instruments;1990-10

3. Design and implementation of a high performance E-beam tester;Microelectronic Engineering;1990-05

4. Electron-optical components for E-beam testing;Microelectronic Engineering;1990-05

5. Survey of electron sources for high-resolution microscopy;Ultramicroscopy;1989-04

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