Author:
Adams Daniel,Alford T.L.,Theodore N.D.,Russell S.W.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Diffusion of Metals in Silicon Dioxide
2. Reaction of Cu‐Ti bilayer films in vacuum and hydrogen
3. Deep Impurities in Semiconductors;Milnes,1993
4. S.W. Russell, S.A. Rafalski, R.L. Spreitzer, J. Li, M. Moinpour, F. Moghadam and T.L. Alford, Thin Solid Films, in press.
Cited by
5 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献