Simultaneous deposition and fusion flow planarization of borophosphosilicate glass in a new chemical vapor deposition reactor-Reference-Cited by-同舟云学术

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Simultaneous deposition and fusion flow planarization of borophosphosilicate glass in a new chemical vapor deposition reactor

Published:1991-12 Issue:1-2 Volume:206 Page:64-69
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kern Werner,Hartman Jim

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. SEMICON/West '82 Technical Proc.;Ramiller,1982

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review—Mechanical Stress in Chemically Vapor Phase Deposited Boron- and Phosphorus-Contained Silicate Glass Thin Films: A Review;ECS Journal of Solid State Science and Technology;2020-05-13

2. A 3-in-1 doping process for interdigitated back contact solar cells exploiting the understanding of co-diffused dopant profiles by use of PECVD borosilicate glass in a phosphorus diffusion;Progress in Photovoltaics: Research and Applications;2016-02-10

3. Catalytic effect of phosphine on the deposition of phosphosilicate glass from tetraethoxysilane;Applied Physics Letters;1993-02-15

4. Reduced Thermal Budget Borophosphosilicate Glass (BPSG) Fusion and Implant Activation Using Rapid Thermal Annealing and Steam Reflow;MRS Proceedings;1993

5. Comparative Study of Simultaneous Implant Activation and Borophosphosilicate Glass (BPSG) Reflow During Rapid Thermal Processing (RTP) and Furnace Annealing on Complex Topographies;MRS Proceedings;1992

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