Ancillary properties of vapor-deposited carbide coatings-Reference-Cited by-同舟云学术

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Ancillary properties of vapor-deposited carbide coatings

Published:1977-01 Issue: Volume:40 Page:201-209
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Taylor Kenneth A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. U.S. Patent No. 3,791,852;Bunshah,1974

2. Activated Reactive Evaporation Process for High Rate Deposition of Compounds

3. High speed friction and wear characteristics of vapor-deposited coatings of TiC and WC+Co in a vacuum environment;Taylor;Charles Stark Draper Lab. Rep. P-286,1976

4. Standard Handbook for Electrical Engineers;Knowlton,1949

5. Handbook of Thin Film Technology;Maissel,1970

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of WC/C coated rolling element to improve bearing life;Surface Engineering;2023-01-02

2. Tungsten Carbides;Ultra-High Temperature Materials IV;2022

3. Titanium Monocarbide;Ultra-High Temperature Materials III;2020

4. Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmosphere;Thin Solid Films;2019-10

5. Mechanical and Tribological Properties of W₍₁₀₀_-x)_%C_x_% Coatings Deposited by DC Magnetron Sputtering;Key Engineering Materials;2015-04

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