Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films Part II. Transition from porous to compact films and microstructural inhomogeneity of the layers-Reference-Cited by-同舟云学术

Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films Part II. Transition from porous to compact films and microstructural inhomogeneity of the layers

Published:1995-11 Issue:1-2 Volume:268 Page:72-82
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kužel R.,Černý R.,Valvoda V.,Blomberg M.,Merisalo M.,Kadlec S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. High Rate Thick Film Growth

2. Ion-assisted sputtering of TiN films

3. Low‐energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure

4. Microstructure of titanium nitride thin films controlled by ion bombardment in a magnetron-sputtering device

5. Complex XRD microstructural studies of hard coatings applied to PVD-deposited TiN films Part I. Problems and methods

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Measuring texture-component-dependent stress of CuZn39Pb2 by neutron diffraction;International Journal of Mechanical Sciences;2024-05

2. Plasma Enhanced High-Rate Deposition of Advanced Film Materials by Metal Reactive Evaporation in Organosilicon Vapors;Membranes;2023-03-24

3. Assessment of plastic damage in high strength structural steel using electromagnetic technique;Materials Science and Technology;2020-06-10

4. Microstructure, Stress and Texture in Sputter Deposited TiN Thin Films: Effect of Substrate Bias;Advanced Materials Research;2014-08

5. Strain and deformation in ultra-hard nanocomposites nc-TiN/a-BN under hydrostatic pressure;Materials Science and Engineering: A;2006-11