Optical constants of silicon films deposited by the r.f. glow discharge of SiCl4-Reference-Cited by-同舟云学术

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Optical constants of silicon films deposited by the r.f. glow discharge of SiCl4

Published:1981-12 Issue:4 Volume:86 Page:359-367
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Augelli V.,Murri R.,Schiavulli L.,Bruno G.,Capezzuto P.,Cramarossa F.,Evangelisti F.,Fortunato G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. R.f. plasma deposition of amorphous silicon films from SiCl4-H2

2. Physical characterization of halogenated and hydrogenated amorphous silicon films

3. An Amorphous-Silicon Film Usable at High-Temperature –Annealing Properties of a New Fluorinated Amorphous-Silicon–

4. Properties of amorphous Si:F:H alloys

5. Influence of halides on the photoconductivity dark conductivity and photoluminescence of a-Si:H

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1. Synthesis and Characterization of Halogenated Amorphous Silicon via a Novel Glow Discharge Process;Chemistry of Materials;1998-01-01

2. Optical and structural properties of sputtered CdTe thin films;Renewable Energy;1994-08

3. Chemical Vapor Deposition Under Plasma Conditions;Film Deposition by Plasma Techniques;1992

4. Chemical bonding in microcrystalline Si:H:Cl films studied by ion-induced Auger Electron Spectroscopy;Thin Solid Films;1989-06

5. Carrier lifetime from transient photoconductivity measurements on microcrystalline silicon films;Thin Solid Films;1986-08

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