Reactive magnetron sputter deposition of CNx films on Si(001) substrates: film growth, microstructure and mechanical properties-Reference-Cited by-同舟云学术

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Reactive magnetron sputter deposition of CNx films on Si(001) substrates: film growth, microstructure and mechanical properties

Published:1994-06 Issue:1-2 Volume:246 Page:103-109
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Sjöström H.,Ivanov I.,Johansson M.,Hultman L.,Sundgren J.-E.,Hainsworth S.V.,Page T.F.,Wallenberg L.R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Prediction of New Low Compressibility Solids

2. Structural properties and electronic structure of low-compressibility materials: β-Si3N4and hypothetical β-C3N4

3. Structural and optical properties of amorphous carbon nitride

4. Reactive sputtering of carbon and carbide targets in nitrogen

5. Properties of hydrogenated amorphous carbon films and the effects of doping

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