Friction and erosive wear of controlled nucleation thermochemically deposited W-C alloys and SiC and chemically vapor-deposited Si3N4-Reference-Cited by-同舟云学术

Friction and erosive wear of controlled nucleation thermochemically deposited W-C alloys and SiC and chemically vapor-deposited Si3N4

Published:1980-10 Issue:3 Volume:72 Page:503-509
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Stiglich Jacob J.,Bhat Deepak G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. CM 500, U.S. Patent 4,147,820; CM 6000, U.S. Patent 4,040,870, U.S. Patent 4,153,483, to San Fernando Laboratories, Dart Industries Inc.

2. Proc. 6th Int. Conf. on Chemical Vapor Deposition;Holzl,1977

3. High temperature structural ceramic materials by CNTD process;Stiglich;Ceramurgia,1980

4. An investigation of the CNTD mechanism and its effect on microstructural properties;Holzl;U.S. Air Force Systems Command (Contract F49620-77-0086),1979

5. 80th Annu. Meet. of American Ceramic Society;Dutta,1978

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