Structural changes of evaporated tantalum during film growth
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. Mean free path and density of conductance electrons in platinum determined by the size effect in extremely thin films
2. Resistivity and Temperature Coefficient of Thin Metal Films with Rough Surface
3. The mean free path of electrons in metals
4. Ph.D. Thesis;Mayer,1980
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