The threshold current density and incubation time to electromigration in gold films-Reference-Cited by-同舟云学术

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The threshold current density and incubation time to electromigration in gold films

Published:1977-10 Issue:2 Volume:46 Page:139-150
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Kinsbron E.,Blech I.A.,Komem Y.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Electromigration and crevice formation in thin metallic films

2. Current-induced marker motion in gold wires

3. Electromigration of Ti–Au thin‐film conductors at 180° C

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