Controlled index of refraction silicon oxynitride films characterized by variable angle spectroscopic ellipsometry-Reference-Cited by-同舟云学术

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Controlled index of refraction silicon oxynitride films characterized by variable angle spectroscopic ellipsometry

Published:1991-12 Issue:1-2 Volume:206 Page:248-253
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Xiong Yi-Ming,Snyder Paul G.,Woollam John A.,Al-Jumaily G.A.,Gagliardi F.J.,Krosche Eric R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Properties of Si[sub x]O[sub y]N[sub z] Films on Si

2. Films of Silicon Nitride-Silicon Dioxide Mixtures

3. Silicon Oxynitride Films from the NO-NH[sub 3]-SiH[sub 4] Reaction

4. Oxynitride Deposition Kinetics in a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 System

5. Physicochemical Properties of Chemical Vapor‐Deposited Silicon Oxynitride from a SiH4 ‐ CO 2 ‐ NH 3 ‐ H 2 System

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1. Precision of Silicon Oxynitride Refractive-Index Profile Retrieval Using Optical Characterization;Acta Physica Polonica A;2021-09

2. Role of Hydrogen and Nitrogen on the Surface Chemical Structure of Bioactive Amorphous Silicon Oxynitride Films;The Journal of Physical Chemistry B;2017-09-14

3. Synthesis and characterization of the mechanical and optical properties of Ca-Si-O-N thin films deposited by RF magnetron sputtering;Surface and Coatings Technology;2017-04

4. Novel transparent MgSiON thin films with high hardness and refractive index;Vacuum;2016-09

5. Stoichiometric silicon oxynitride thin films reactively sputtered in Ar/N2O plasmas by HiPIMS;Journal of Physics D: Applied Physics;2016-03-01

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