In situ study of thin film growth by internal stress measurement under ultrahigh vacuum conditions: Silver and copper under the influence of oxygen
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference15 articles.
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2. Proc. 8th Int. Vacuum Congr.;Koch,1980
3. The influence of O2, H2, H2O, N2, CO and CH4 on the structure of thin silver films investigated by ultrahigh vacuum internal stress measurements
4. R. Koch, H. Leonhard, G. Thurner and R. Abermann, to be published.
5. Grain Growth and Stress Relief in Thin Films
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