Rapid thermal annealing of arsenic-implanted silicon: A review
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference77 articles.
1. Laser and Electron-Beam Interactions and Material Processing;Hill,1981
2. Short Time Annealing
3. Conduction of Heat in Solids;Carslaw,1956
4. Silicon Integrated Circuits;Celler,1985
5. Laser Annealing of Semiconductors,1982
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A novel to control defects of P-N semiconductor device by SRFE process;IOP Conference Series: Materials Science and Engineering;2021-02-01
2. Structural transformation in silicon by pulse heating;Progress in Crystal Growth and Characterization of Materials;1992-01
3. Enhanced Diffusion of Impurities in Silicon during Rapid Thermal Annealing (Computer Simulation);Physica Status Solidi (a);1991-06-16
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