Properties of TiNxfilms reactively sputtered in an argon-nitrogen atmosphere-Reference-Cited by-同舟云学术

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Properties of TiNxfilms reactively sputtered in an argon-nitrogen atmosphere

Published:1979-10 Issue:3 Volume:62 Page:347-351
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Posadowski Witold,Król-Stȩpniewska Lubomiła,Ziołowski Zbigniew

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Transition Metal Carbides and Nitrides;Toth,1971

2. Structure and Electrical Properties of Evaporated and Sputtered Titanium Films

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3. Film texture evolution in plasma treated TiN thin films;Journal of Applied Physics;1999-08-15

4. Microstructure and Hardness of Hollow Cathode Discharge Ion-Plated Titanium Nitride Film;Journal of Materials Engineering and Performance;1998-06-01

5. X-Ray diffraction investigations of magnetron sputtered TiCN coatings;Surface and Coatings Technology;1995-09

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