Using thin film stress to produce precision, figured X-ray optics-Reference-Cited by-同舟云学术

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Using thin film stress to produce precision, figured X-ray optics

Published:1992-11 Issue:1-2 Volume:220 Page:284-288
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Yuan F.,Shi Y.,Knight L.V.,Perkins R.T.,Allred D.D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference8 articles.

1. Physical Properties of Crystals;Nye,1975

2. Characterization of boron films prepared by chemical vapor deposition and their applications in X-ray imaging;Yuan,1991

3. Development and modeling of cylindrically shaped multilayer X-ray reflectors;Shi,1991

4. Young's Modulus, Shear Modulus, and Poisson's Ratio in Silicon and Germanium

5. Advanced Mechanics of Materials;Cook,1985

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Elimination of Curvature in Microelectromechanical-System Membrane;ECS Transactions;2013-05-03

2. Deformation and Restoration of Shape in Microelectromechanical System Membrane;ECS Journal of Solid State Science and Technology;2013

3. RESIDUAL STRESS IN A THIN-FILM MICROOPTOELECTROMECHANICAL (MOEMS) MEMBRANE;Mechanika;2012-06-19

4. Impact of Thermal Stresses on Micro-fabricated Devices Used for Optical Applications;Advances in Mechanisms Design;2012

5. Elimination of stress-induced curvature in thin-film structures;Journal of Microelectromechanical Systems;2002-10

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