Vapour phase growth of semiconducting layers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference111 articles.
1. Intermetallic Semiconducting Films;Wieder,1970
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Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. References;Thin Films by Chemical Vapour Deposition;1990
2. Epitaxial growth of GaAs in chloride transport systems;Progress in Crystal Growth and Characterization;1983-01
3. Chemical vapour deposition of silicon films in capillary layers;Thin Solid Films;1982-05
4. Chemical Vapor Deposition of Tin on Iron or Carburized Iron;Journal of The Electrochemical Society;1980-10-01
5. Crystal growth and properties of binary, ternary and quaternary (In,Ga)(As,P) alloys grown by the hydride vapor phase epitaxy technique;Progress in Crystal Growth and Characterization;1979
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