Application of plasma etching techniques to metal-oxide-semiconductor (MOS) processing
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference10 articles.
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2. Fundamental aspect and behavior of saturated fluorocarbons in glow discharge in absence of potential source of hydrogen;Journal of Polymer Science Part A: Polymer Chemistry;1992-07
3. LiNbO3 - A Practical Optoelectronic Waveguide Technology?;Integrated and Guided-Wave Optics;1988
4. Subtractive Etching;Semiconductor Lithography;1988
5. Kinetics of formation and reactions of radicals in radio-frequency pulsed discharges in CCl4/NH3mixtures;Journal of Physics D: Applied Physics;1987-07-14
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