Physical and chemical etching in plasmas-Reference-Cited by-同舟云学术

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Physical and chemical etching in plasmas

Published:1981-12 Issue:2-3 Volume:86 Page:101-116
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Curran J.E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference60 articles.

1. A Technology of Thin-Film Hybrid Microwave Circuits

2. Proc. 12th Annu. Reliability Physics Symp.;Gajda,1974

3. Thin Film Processes,1978

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Defect spinel oxides for electrocatalytic reduction reactions;Nano Research;2023-12-29

2. Thin and Thick Films;Sensors;2008-03-20

3. References;Thin Films by Chemical Vapour Deposition;1990

4. Subtractive Etching;Semiconductor Lithography;1988

5. Plasma cleaning in an a-Si:H deposition chamber;Vacuum;1986-01

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